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High-Rate Reactive Magnetron Sputter Deposition and Characterization of Metal Oxide Films (Comprehensive Summaries of Uppsala Dissertations, 520) ePub download

by Maryam Kharrazi Olsson

  • Author: Maryam Kharrazi Olsson
  • ISBN: 9155446833
  • ISBN13: 978-9155446833
  • ePub: 1296 kb | FB2: 1988 kb
  • Language: English
  • Category: Physics
  • Publisher: Uppsala Universitet (August 10, 2000)
  • Rating: 4.7/5
  • Votes: 352
  • Format: mobi doc lrf lit
High-Rate Reactive Magnetron Sputter Deposition and Characterization of Metal Oxide Films (Comprehensive Summaries of Uppsala Dissertations, 520) ePub download

University dissertation from Uppsala : Acta Universitatis Upsaliensis. Abstract: Molybdenum oxide films with good electrochromic properties were produced by single- and dual-target sputtering.

Dissertation: High-rate reactive magnetron sputter deposition and characterization of metal oxide films. University dissertation from Uppsala : Acta Universitatis Upsaliensis. Dual-target deposition was shown to be able of yielding optically functional films at much higher rates than that for single-target depositions.

Reactive magnetron sputtering is a widely used deposition technique for oxide coatings

Reactive magnetron sputtering is a widely used deposition technique for oxide coatings. It. has many applications due to its simplicity, versatility and possibility to be scaled up for large-area. The sputter-deposition process of TiO2 thin films was investigated, When an oxide target is used, high-rate deposition above 57 nm/ min can be realized by sputtering under a condition of low oxygen gas content. Under this sputtering condition, a Ti rich surface layer is formed by selective sputtering of oxygen atoms, and a large amount of Ti atoms are sputtered from this layer.

Kharrazi Olsson, Maryam Verfasser. Publication, Distribution, et. Uppsala. Dissertation Note: Vollst. Download now High-rate reactive magnetron sputter deposition and characterization of metal oxide films: Download PDF book format. Download DOC book format.

Hysteresis-free high rate reactive sputtering of niobium oxide, tantalum oxide, and aluminum oxide. This work deals with reactive magnetron sputtering of vanadium oxide films with different oxygen contents from vanadium metal target. Journal Article Särhammar, Erik, E-mail: erik. se ; Berg, Sören ; Nyberg, Tomas - Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films. The presence of vanadium mixed oxides at both target and substrate surface producedmore during reactive-sputtering process are included.

For example, in magnetron sputtering, the deposition parameters such . Characterization of nano-structured TiN thin films prepared by . magnetron sputtering. Mater Lett 2005;59:3929–32.

For example, in magnetron sputtering, the deposition parameters such as substrate tem-perature, pressure, target power, substrate bias, and energy and flux of bombarding particles utilized for growing the films are known to influence grain growth and crystallographic texture, which affect the resulting microstructure and properties of the films. However, high temperature deposition resulted in non-competitive growth with a fully dense (200) orientation in the initial monolayer of the film. Troll LE. Transition Metal Carbides and Nitrides.

Sputter deposition is a physical vapor deposition (PVD) method of thin film deposition by sputtering. This involves ejecting material from a "target" that is a source onto a "substrate" such as a silicon wafer

Sputter deposition is a physical vapor deposition (PVD) method of thin film deposition by sputtering. This involves ejecting material from a "target" that is a source onto a "substrate" such as a silicon wafer. Resputtering is re-emission of the deposited material during the deposition process by ion or atom bombardment.

Reactive sputter deposition is a physical vapour deposition technique, where a metallic target is sputtered by ions . T. Matsunaga, H. Maezawa, and T. Noguchi, Characterization of nbtin thin lms prepared by reactive dc-magnetron sputtering, IEEE trans.

Reactive sputter deposition is a physical vapour deposition technique, where a metallic target is sputtered by ions of an inert element from a plasma while a ow of reactive gas passes the the whole system, including the target, plasma and substrate. For the fabrication of niobium titanium nitride (NbTiN), an alloy target of niobium and titanium is. used in combination with argon and nitrogen as inert and reactive gasses respectively. on applied superconductivity, vol. 13, pp. 3284–3287, 2003.

Comprehensive Summaries of Uppsala Dissertations from the Faculty of Science and Technology 1023 Investigation of. .

Comprehensive Summaries of Uppsala Dissertations from the Faculty of Science and Technology 1023 Investigation of Novel Metal Gate and High-κ Dielectric Materials for CMOS Technologies BY JÖRGEN WESTLINDER ACTA UNIVERSITATIS UPSALIENSIS UPPSALA 2004 ! . VIII Simulation and dielectric characterization of reactive dc magnetron co-sputtered (Ta2O5)1-x(TiO2)x thin films J. Westlinder, Y. Zhang, F. Engelmark, G. Possnert, . O. Blom, J. Olsson, and S. Berg Journal of Vacuum Science and Technology, B 20, no. 3, pp. 855-861, 2002.

On the Deposition Rates of Magnetron Sputtered Thin Films at Oblique Angles. Characterization and device applications of ZnO films deposited by high power impulse magnetron sputtering (HiPIMS)

On the Deposition Rates of Magnetron Sputtered Thin Films at Oblique Angles. Plasma Processes and Polymers, Vol. 11, Issue. Characterization of the energy flux toward the substrate during magnetron sputter deposition of ZnO thin films. Plasma Sources Science and Technology, Vol. 22, Issue. Characterization and device applications of ZnO films deposited by high power impulse magnetron sputtering (HiPIMS). Journal of Physics D: Applied Physics, Vol. 46, Issue.

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